The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2012
Filed:
Apr. 23, 2007
Applicants:
Jin Wuk Kim, Uiwang-si, KR;
Yeon Heui Nam, Gangneung-si, KR;
Inventors:
Jin Wuk Kim, Uiwang-si, KR;
Yeon Heui Nam, Gangneung-si, KR;
Assignee:
LG Display Co., Ltd., Seoul, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B28B 11/08 (2006.01); B29C 35/08 (2006.01); B29C 59/00 (2006.01); C08B 5/00 (2006.01); B44C 1/22 (2006.01); C03C 15/00 (2006.01); C03C 25/68 (2006.01); C23F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A resist composition used for the imprint lithography process, a method for forming resist pattern using the same, an array substrate manufactured using the same, and method of fabricating the array substrate includes an additive and the adhesion promoter inducing the chemical bond of the base layer contacting to the UV curable resin. As a result, it is possible for the resist composition to form a high-resolution pattern and to improve the durability of the mold for molding a UV curable resin.