The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2012
Filed:
Nov. 16, 2009
Kyunghyun Sung, Union City, CA (US);
Krishna S. Nayak, Los Angeles, CA (US);
Kyunghyun Sung, Union City, CA (US);
Krishna S. Nayak, Los Angeles, CA (US);
University of Southern California, Los Angeles, CA (US);
Abstract
Embodiments of the present disclosure are directed to systems and methods for providing tailored RF pulse trains, based on estimated B0 and B1 profiles, for uniform saturation for MRI techniques. The tailored pulse trains are optimized to minimize residual longitudinal magnetization in target tissue. The B0 and B1 profiles can be measured a priori over a desired region of a patient, e.g., the heart, and can overcome or mitigate SAR and B1 inhomogeneity constraints. In exemplary embodiments, the tailored pulse trains can include hard pulses with unequal weighting. In other embodiments, the tailored pulse trains can include BIR-4 pulse trains that are optimized to minimize residual longitudinal magnetization in target tissue. The tailored pulse train designs can improve the immunity to B1 variation while maintaining low RF power. MRI systems, methods, and controllers for providing tailored pulse trains are described.