The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2012
Filed:
Jul. 04, 2007
Jacques Pelletier, Saint Martin d'Heres, FR;
Ana Lacoste, Saint Martin le Vinoux, FR;
Stéphane Bechu, Chantesse, FR;
Jacques Pelletier, Saint Martin d'Heres, FR;
Ana LaCoste, Saint Martin le Vinoux, FR;
Stéphane Bechu, Chantesse, FR;
Centre National de la Recherche Scientifique (CNRS), Paris, FR;
Universite Joseph Fourier—Grenoble 1, St. Martin d'Heres, FR;
Abstract
The invention concerns a device for producing and/or confining a plasma (), comprising a recipient () within the volume of which the plasma is produced or confined, wherein said recipient comprises a wall () defining a lining () at the inside of the recipient and encompassing the volume, characterized in that it comprises at least one annular magnet (), centered around a normal () with respect to the lining, having radial magnetization direction, such that the magnetization direction is significantly perpendicular to said normal to the lining. The invention also concerns a method for producing and/or confining a plasma.