The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 04, 2012

Filed:

Sep. 20, 2010
Applicants:

Kanshi Chinone, Hitachi, JP;

Seiji Miyaoka, Hitachi, JP;

Inventors:

Kanshi Chinone, Hitachi, JP;

Seiji Miyaoka, Hitachi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01F 17/00 (2006.01); B24D 3/02 (2006.01); C09C 1/68 (2006.01); C09K 3/14 (2006.01);
U.S. Cl.
CPC ...
Abstract

A cerium salt wherein, when 20 g of the cerium salt is dissolved in a mixed liquid of 12.5 g of 6N nitric acid and 12.5 g of a 30% hydrogen peroxide aqueous solution, a concentration of an insoluble component present in the solution is 5 ppm or less by mass ratio to the cerium salt before dissolution and cerium oxide produced by processing the cerium salt at high temperatures. Scratch on a surface to be polished can be reduced when a cerium based polishing slurry containing the cerium oxide particles is used, since an amount of impurities in cerium oxide particles and cerium salt particles, raw material thereof, is reduced for high purification.


Find Patent Forward Citations

Chinone, Kanshi. (2012). Cerium salt, producing method thereof, cerium oxide and cerium based polishing slurry (U.S. Patent No. 8323604). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8323604

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…