The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2012
Filed:
Jan. 29, 2009
Applicants:
Tzong-ming Lee, Hsinchu, TW;
Ruoh-huey Uang, Hsinchu County, TW;
Kuo-chan Chiou, Tainan, TW;
Yu-ming Wang, Taichung, TW;
Yi-ting Cheng, Kaohsiung, TW;
Inventors:
Tzong-Ming Lee, Hsinchu, TW;
Ruoh-Huey Uang, Hsinchu County, TW;
Kuo-Chan Chiou, Tainan, TW;
Yu-Ming Wang, Taichung, TW;
Yi-Ting Cheng, Kaohsiung, TW;
Assignee:
Industrial Technology Research Institute, Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 3/06 (2006.01); B29C 35/08 (2006.01); B29C 59/16 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for manufacturing a substrate with surface substrates by employing photothermal effect is described. Nanoparticles on the surface of the substrate excited by a beam convert light energy to thermal energy. The surface structure on the substrate is formed through the thermal energy generated by the excited nanoparticles. The substrate with plural pores is thus formed.