The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 04, 2012

Filed:

Jul. 03, 2007
Applicants:

Masakazu Hirata, Symbiosis, SG;

Manabu Oumi, Chiba, JP;

Majung Park, Chiba, JP;

Inventors:

Masakazu Hirata, Symbiosis, SG;

Manabu Oumi, Chiba, JP;

Majung Park, Chiba, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11B 13/08 (2006.01); G11B 9/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of manufacturing a near-field optical head. A first projection shaped in a quadrangular pyramid is formed on a surface of a substrate for providing a near-field optical element of the near-field optical head. A second projection shaped in a frustum of quadrangular pyramid is formed on the surface of the substrate for providing an air bearing surface of the near-field optical head. A metal film is formed on at least one surface of the first projection and the metal film is connected with a resistance meter through a conduction wiring for detecting an electrical resistance of the metal film. The first and second projections and the metal film are polished while the resistance meter detects an electrical resistance of the metal film and until the detected electrical resistance reaches a predetermined value such that a top surface of the first projection has a specified size and becomes flush with a surface of the second projection providing the air bearing surface.


Find Patent Forward Citations

Loading…