The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2012
Filed:
Nov. 05, 2009
Applicants:
Shih-chia Huang, Taipei, TW;
Sy-yen Kuo, Taipei, TW;
Inventors:
Shih-Chia Huang, Taipei, TW;
Sy-Yen Kuo, Taipei, TW;
Assignee:
Acer Incorporated, Hsichih, Taipei Hsien, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H04N 7/34 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for performing spatial error concealment is provided. The method includes the following steps: detecting a damaged macroblock; obtaining coding information of neighboring macroblocks of the damaged macroblock; determining edge feature of the damaged macroblock based on the coding information; and according to the edge feature, selecting a bilinear interpolation algorithm or a directional interpolation algorithm to conceal errors within the damaged macroblock.