The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2012
Filed:
Jul. 12, 2010
David Worthington Hahn, Gainesville, FL (US);
David Worthington Hahn, Gainesville, FL (US);
University of Florida Research Foundation, Inc., Gainesville, FL (US);
Abstract
A method and apparatus for analyzing a target material is provided. A first laser beam pulse can be incident on a target material to create an ablation event so as to produce an ablation plume of target material. Such ablation events can include plasma ablation, sub-plasma ablation, and thermal desorption. At least a portion of the ablation plume of target material can then be transported a sufficient distance away from the ablation event that a second laser beam pulse can interact with the at least a portion of the ablation plume of target material to create an analytical plasma such that the analytical plasma is uncoupled from the ablation event. The creation of the analytical plasma results in one or more elements of the at least a portion of the ablation plume of target material undergoing atomic emission, which can be collected and analyzed.