The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8319948 B1

PDF
Full Text
Expired
Date of Patent:
Nov. 27, 2012

Filed:

Sep. 17, 2009
Applicants:

Shu Watanabe, Saitama, JP;

Masato Hagiri, Utsunomiya, JP;

Inventors:

Shu Watanabe, Saitama, JP;

Masato Hagiri, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/62 (2006.01); G03B 27/32 (2006.01);
U.S. Cl.
CPC ...
Abstract

An exposure apparatus includes an original stage mounted with an exposure original having a pattern used for exposure, and an evaluation original having a pattern used to evaluate an optical performance of a projection optical system, a first drive mechanism configured to drive the original stage in a first direction that is a scan direction, and a second drive mechanism configured to drive the evaluation original on the original stage in a second direction orthogonal to the first direction, a width of the evaluation original in the second direction is smaller than that of the exposure original in the second direction.


Find Patent Forward Citations

Watanabe, Shu. (2012). Evaluation method and exposure apparatus (U.S. Patent No. 8319948). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8319948

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