The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 27, 2012

Filed:

Feb. 01, 2010
Applicants:

Han-kang Liu, Tainan County, TW;

Fang-ming Huang, Grand Cayman, KY;

Shao-min Hung, Tainan County, TW;

Bo-nan Chen, Tainan County, TW;

Inventors:

Han-Kang Liu, Tainan County, TW;

Fang-Ming Huang, Grand Cayman, KY;

Shao-Min Hung, Tainan County, TW;

Bo-Nan Chen, Tainan County, TW;

Assignees:

Himax Technologies Limited, Fonghua Village, Xinshi Dist., Tainan, TW;

Himax Imaging, Inc., Grand Cayman, KY;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of fabricating an image sensor and an image sensor thereof are provided. The method comprises: providing a mask; utilizing the mask at a first position to form a first group of micro-lenses having a first height on a first group of color filters of a color filter array on a pixel array; shifting the mask from the first position to a second position, wherein a distance between the first position and the second position is substantially equal to a width of a pixel of the pixel array; and utilizing the mask at the second position to form a second group of micro-lenses having a second height, different from the first height, on a second group of color filters of the color filter array.


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