The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2012
Filed:
May. 05, 2009
Ronald Scott Bunker, Niskayuna, NY (US);
Wenwu Zhang, Schenectady, NY (US);
Wilbur Douglas Scheidt, Cincinnati, OH (US);
Magdi Naim Azer, Niskayuna, NY (US);
Marshall Gordon Jones, Scotia, NY (US);
Ching-pang Lee, Cincinnati, OH (US);
Ronald Scott Bunker, Niskayuna, NY (US);
Wenwu Zhang, Schenectady, NY (US);
Wilbur Douglas Scheidt, Cincinnati, OH (US);
Magdi Naim Azer, Niskayuna, NY (US);
Marshall Gordon Jones, Scotia, NY (US);
Ching-Pang Lee, Cincinnati, OH (US);
General Electric Company, Niskayuna, NY (US);
Abstract
A system for producing at least one trench to improve film cooling in a sample is provided. The system includes at least one laser source outputting at least one pulsed laser beam. The pulsed laser beam includes a pulse duration including a range less than about 50 μs, an energy per pulse having a range less than about 0.1 Joule, and a repetition rate with a range greater than about 1000 Hz. The system also includes a control subsystem coupled to the laser source, the control subsystem configured to synchronize a position of the sample with the pulse duration and energy level in order to selectively remove at least one of a thermal barrier coating, a bondcoat and a substrate metal in the sample to form the at least one trench.