The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 27, 2012

Filed:

Mar. 28, 2011
Applicants:

Michael Duerr, Esslingen, DE;

Andreas Schmid, Reutlingen, DE;

Gabriele Nelles, Stuttgart, DE;

Akio Yasuda, Esslingen, DE;

Inventors:

Michael Duerr, Esslingen, DE;

Andreas Schmid, Reutlingen, DE;

Gabriele Nelles, Stuttgart, DE;

Akio Yasuda, Esslingen, DE;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 51/44 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention relates to a method of producing a porous semiconductor film and the film resulting from such production. It furthermore relates to an electronic device incorporating such film and to potential uses of such film.


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