The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 27, 2012

Filed:

Aug. 17, 2007
Applicants:

Wen-chiung Su, Taipei, TW;

Cheng-che Tsai, Douliou, TW;

Ching-shiang Yu, Dali, TW;

Shenghong a Dai, Taichung, TW;

Ru-jong Jeng, Taichung, TW;

Inventors:

Wen-Chiung Su, Taipei, TW;

Cheng-Che Tsai, Douliou, TW;

Ching-Shiang Yu, Dali, TW;

Shenghong A Dai, Taichung, TW;

Ru-Jong Jeng, Taichung, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 18/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An organic polyurethane shape memory material includes a C10 chain or C18 chain and consists of hard segment and soft segment. The material is produced by reacting the single-chain type dendrimer with diethylenetriamine to produce dendrimer. Then dendrimer reacts with N-(3-aminopropyl)diethanolamine to produce dendritic diols. Next, polymer HO(CHO)xCHOCH(CHO)OH, where x+y=25˜26, reacts with methylenedi-p-phenyl diisocyanate, and at least one type of dendritic diols is added to produce the organic polyurethane shape memory material.


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