The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2012
Filed:
Mar. 02, 2009
Werner Stockum, Reinheim, DE;
Ingo Koehler, Reinheim, DE;
Arjan Meijer, Darmstadt, DE;
Paul Craig Brookes, Southampton, GB;
Katie Patterson, Portsmouth, GB;
Mark James, Romsey, GB;
Werner Stockum, Reinheim, DE;
Ingo Koehler, Reinheim, DE;
Arjan Meijer, Darmstadt, DE;
Paul Craig Brookes, Southampton, GB;
Katie Patterson, Portsmouth, GB;
Mark James, Romsey, GB;
Merck Patent GmbH, Darmstadt, DE;
Abstract
The present invention relates to compositions, which are useful for the generation of patterned or structured SiO-layers or of SiO-lines during the manufacturing process of semiconductor devices, and which are suitable for the application in inkjet operations. The present invention also relates to a modified process of manufacturing semiconductor devices taking advantage of these new compositions.