The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2012
Filed:
Jun. 30, 2011
Osamu Suzuki, Tokyo, JP;
Hiroyuki Akagawa, Tokyo, JP;
Masaru Tanabe, Tokyo, JP;
Atsushi Kawaguchi, Tokyo, JP;
Naozumi Ishibashi, Tokyo, JP;
Osamu Suzuki, Tokyo, JP;
Hiroyuki Akagawa, Tokyo, JP;
Masaru Tanabe, Tokyo, JP;
Atsushi Kawaguchi, Tokyo, JP;
Naozumi Ishibashi, Tokyo, JP;
Hoya Corporation, Tokyo, JP;
Abstract
A mask blank manufacturing department manufactures a mask blank by forming a thin film to be a mask pattern on a mask blank transparent substrate. When providing the mask blank to a mask manufacturing department, the mask blank manufacturing department provides optical characteristic information (transmittance variation) of the mask blank transparent substrate and optical characteristic information (transmittance variation and/or phase difference variation) of the mask blank to the mask manufacturing department. The optical characteristic information of the mask blank transparent substrate is provided to the mask blank manufacturing department from a materials processing department that manufactures mask blank transparent substrates.