The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2012
Filed:
Jun. 12, 2008
Brian Joseph Scherer, Greenwood Lake, NY (US);
Ahmet Gun Erlat, Clifton Park, NY (US);
Min Yan, Ballston Lake, NY (US);
Brian Joseph Scherer, Greenwood Lake, NY (US);
Ahmet Gun Erlat, Clifton Park, NY (US);
Min Yan, Ballston Lake, NY (US);
General Electric Company, Niskayuna, NY (US);
Abstract
Methods for improving coating or etching uniformity of non-conductive substrates in plasma-mediated processes generally include applying an electrically conductive coating to the non-conductive substrate prior to plasma processing. The electrically conductive coating is disposed in electrical communication with a metallic electrode of a plasma reactor. By disposing a conductive layer on the non-conductive substrate, a uniform electric potential is created during plasma processing can be built up on the non-conductive, which is equivalent to that of the metallic electrode upon which it is disposed during plasma processing.