The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2012
Filed:
Jun. 04, 2009
Jeffrey W. Elam, Elmhurst, IL (US);
Joseph A. Libera, Clarendon Hills, IL (US);
Michael J. Pellin, Naperville, IL (US);
Peter C. Stair, Northbrook, IL (US);
Jeffrey W. Elam, Elmhurst, IL (US);
Joseph A. Libera, Clarendon Hills, IL (US);
Michael J. Pellin, Naperville, IL (US);
Peter C. Stair, Northbrook, IL (US);
Uchicago Argonne, LLC, Chicago, IL (US);
Abstract
Methods for the selective deposition of materials within a porous substrate. The methods use the passivating effects of masking precursors applied to the porous substrate. A portion of a pore surface within the substrate is masked by exposing the substrate to one or more masking precursors. The depth of the pore surface that is masked is controllable by regulating the exposure of the substrate to the masking precursor. Application of the masking precursor prevents adsorption of one or more subsequently applied metal precursors about a portion of the pore surface coated by the masking precursor. Less than an entirety of the unmasked pore surface is coated by the metal precursor, forming a metal stripe on a portion of the pore surface. The depth of the metal stripe is controllable by regulating exposure of the porous substrate to the metal precursor. Subsequent exposure of the substrate to a saturating water application oxidizes the deposited precursors.