The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2012
Filed:
Dec. 27, 2004
Masayuki Tsutsumi, Ohtsu, JP;
Satoshi Maeda, Ohtsu, JP;
Keizo Kawahara, Ohtsu, JP;
Takefumi Yoshida, Ohtsu, JP;
Kazutake Okamoto, Ohtsu, JP;
Morio Morino, Ohtsu, JP;
Shoichi Uemura, Ohtsu, JP;
Akinobu Nagara, Ohtsu, JP;
Noriko Takahashi, Ohtsu, JP;
Hiroko Oyama, Ohtsu, JP;
Shunji Kurahara, Ohtsu, JP;
Jun Yasui, Ohtsu, JP;
Masayuki Tsutsumi, Ohtsu, JP;
Satoshi Maeda, Ohtsu, JP;
Keizo Kawahara, Ohtsu, JP;
Takefumi Yoshida, Ohtsu, JP;
Kazutake Okamoto, Ohtsu, JP;
Morio Morino, Ohtsu, JP;
Shoichi Uemura, Ohtsu, JP;
Akinobu Nagara, Ohtsu, JP;
Noriko Takahashi, Ohtsu, JP;
Hiroko Oyama, Ohtsu, JP;
Shunji Kurahara, Ohtsu, JP;
Jun Yasui, Ohtsu, JP;
Toyo Boseki Kabushiki Kaisha, Osaka-shi, JP;
Abstract
This polyimide film is superior in heat resistance, rigidity and high frequency properties, is free of inconveniences due to curling even when various functional layers are laminated by heating, and is preferable as a substrate film superior in thermal degradation stability for electronic parts. This polyimide film has a planar orientation coefficient of 0.79-0.89 as measured by an X-ray diffraction method, a difference in the surface planar orientation degree between one surface thereof and the other surface thereof of not more than 2 and a curling degree of not more than 5%, which is obtained by imidation of a polyimide precursor film having a particular imidation rate.