The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2012
Filed:
Feb. 29, 2008
Junji Hirose, Osaka, JP;
Takeshi Fukuda, Osaka, JP;
Masato Doura, Osaka, JP;
Akinori Sato, Osaka, JP;
Kenji Nakamura, Osaka, JP;
Junji Hirose, Osaka, JP;
Takeshi Fukuda, Osaka, JP;
Masato Doura, Osaka, JP;
Akinori Sato, Osaka, JP;
Kenji Nakamura, Osaka, JP;
Toyo Tire & Rubber Co., Ltd., Osaka-shi, JP;
Abstract
A method for manufacturing a polishing pad containing substantially spherical cells and having high thickness accuracy includes preparing a cell-dispersed urethane composition by a mechanical foaming method; continuously discharging the cell-dispersed urethane composition from a single discharge port to a substantially central portion in the width direction of a face material A, while feeding the face material A; laminating a face material B on the cell-dispersed urethane composition; then uniformly adjusting the thickness of the cell-dispersed urethane composition by thickness adjusting means; curing the cell-dispersed urethane composition with the thickness adjusted in the preceding step without applying any additional load to the composition so that a polishing sheet including a polyurethane foam is formed; and cutting the polishing sheet.