The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2012
Filed:
Jun. 30, 2010
Applicants:
Katsuya Ide, Suwa, JP;
Kei Hiruma, Chino, JP;
Inventors:
Katsuya Ide, Suwa, JP;
Kei Hiruma, Chino, JP;
Assignee:
Seiko Epson Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61K 9/48 (2006.01); A61K 9/50 (2006.01); A61J 3/07 (2006.01);
U.S. Cl.
CPC ...
Abstract
A gel manufacturing apparatus adapted to generate gel by making a first solution and a second solution react with each other includes: a flow mechanism adapted to make the second solution flow; an ejection mechanism having a nozzle plate provided with a nozzle adapted to eject the first solution to the second solution made to flow using a droplet ejection method; and a gap plate provided with a through hole communicated with the nozzle, wherein the gap plate is disposed between the flow mechanism and the ejection mechanism.