The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2012
Filed:
Oct. 01, 2009
Philip Edward Miller, Livermore, CA (US);
Tayyab Ishaq Suratwala, Pleasanton, CA (US);
Jeffrey Devin Bude, Danville, CA (US);
Nan Shen, Fremont, CA (US);
William Augustus Steele, Tracy, CA (US);
Ted Alfred Laurence, Livermore, CA (US);
Michael Dennis Feit, Livermore, CA (US);
Lana Louie Wong, Pleasanton, CA (US);
Philip Edward Miller, Livermore, CA (US);
Tayyab Ishaq Suratwala, Pleasanton, CA (US);
Jeffrey Devin Bude, Danville, CA (US);
Nan Shen, Fremont, CA (US);
William Augustus Steele, Tracy, CA (US);
Ted Alfred Laurence, Livermore, CA (US);
Michael Dennis Feit, Livermore, CA (US);
Lana Louie Wong, Pleasanton, CA (US);
Lawrence Livermore National Security, LLC, Livermore, CA (US);
Abstract
A method for preventing damage caused by high intensity light sources to optical components includes annealing the optical component for a predetermined period. Another method includes etching the optical component in an etchant including fluoride and bi-fluoride ions. The method also includes ultrasonically agitating the etching solution during the process followed by rinsing of the optical component in a rinse bath.