The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 13, 2012

Filed:

Sep. 13, 2011
Applicants:

Wei Peng, Fremont, CA (US);

Tong Sun, Penfield, NY (US);

Inventors:

Wei Peng, Fremont, CA (US);

Tong Sun, Penfield, NY (US);

Assignee:

Xerox Corporation, Norwalk, CT (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system and method for identifying a key influencer in a social media environment for enterprise marketing utilizing topic modeling and social diffusion analysis. A user interest profile can be generated by analyzing historical data stored in a database utilizing. A social graph can be generated and an influence measuring process based on the social graph data can be performed utilizing a static diffusion model and a dynamic diffusion model to calculate a set of key influencers. The dynamic diffusion model considers time stamp information to assess an impact of each user communication on the growth of a conversation within a time period. The key influencer can be identified in a specific topic area and a number of total users that can be reached via the influencer within a specific time window can be predicted.


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