The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2012
Filed:
Oct. 03, 2008
Joel O'dwyer, Shellharbour, AU;
James Tickner, Meadows, AU;
Joel O'Dwyer, Shellharbour, AU;
James Tickner, Meadows, AU;
Commonwealth Scientific and Industrial Research Organisation, Australian Capital Territory, AU;
Abstract
An on-line EDXRD analyser including (i) a housing defining an analysis zone and having a passageway through it to allow transport of material in a process stream to pass through the analysis zone, (ii) a collimated source of polychromatic X-rays, (iii) an energy-resolving (ER)X-ray detector, (iv) a primary beam collimator disposed between the source of X-rays and the (ER)X-ray detector comprising an annular slit which defines an incident beam of polychromatic X-rays to irradiate a portion of the analysis zone, (v) a scatter collimator disposed between the primary beam collimator and the ERX-ray detector, the scatter collimator comprising an annular slit which defines a diffracted beam of X-rays scattered by the material to converge towards the ERX-ray detector, and (vi) a detector collimator comprising a conical opening which further defines the diffracted beam of X-rays scattered by the material. The ERX-ray detector measures an energy spectrum of the diffracted X-rays at a predetermined diffraction angle defined by the relative positioning of (ii) to (vi), and where one of (iv) and (v) comprises an aperture arranged to enable a detector to measure the transmission of a direct beam of X-rays through the material.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile