The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 13, 2012

Filed:

Dec. 19, 2008
Applicants:

Marcos Dantus, Okemos, MI (US);

Vadim V. Lozovoy, Holt, MI (US);

Bingwei Wu, East Lansing, MI (US);

Inventors:

Marcos Dantus, Okemos, MI (US);

Vadim V. Lozovoy, Holt, MI (US);

Bingwei Wu, East Lansing, MI (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 3/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

A direct ultrashort laser system is provided. In another aspect of the present invention, a method of measuring laser pulse phase distortions is performed without requiring an adaptive pulse shaper or interferometry. In yet another aspect of the present invention, a system, a method of operating, a control system, and a set of programmable computer software instructions perform Multiphoton Intrapulse Interference Phase Scan processes, calculations, characterization and/or correction without requiring an adaptive pulse shaper.


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