The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2012
Filed:
Oct. 14, 2011
Martin J. Goldberg, Saratoga, CA (US);
Martin Diggelman, Nierdorf, CH;
Earl A. Hubbell, Palo Alto, CA (US);
Glenn H. Mcgall, Palo Alto, CA (US);
Nam Quoc Ngo, Campbell, CA (US);
Macdonald Morris, Felton, CA (US);
Melvin Yamamoto, Fremont, CA (US);
Jennifer Tan, Newark, CA (US);
Richard P. Rava, Redwood City, CA (US);
Martin J. Goldberg, Saratoga, CA (US);
Martin Diggelman, Nierdorf, CH;
Earl A. Hubbell, Palo Alto, CA (US);
Glenn H. McGall, Palo Alto, CA (US);
Nam Quoc Ngo, Campbell, CA (US);
MacDonald Morris, Felton, CA (US);
Melvin Yamamoto, Fremont, CA (US);
Jennifer Tan, Newark, CA (US);
Richard P. Rava, Redwood City, CA (US);
Affymetrix, Inc., Santa Clara, CA (US);
Abstract
The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.