The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2012
Filed:
Aug. 22, 2007
Carmel Majidi, Berkeley, CA (US);
Richard Groff, Berkeley, CA (US);
Ronald S. Fearing, El Cerrito, CA (US);
Carmel Majidi, Berkeley, CA (US);
Richard Groff, Berkeley, CA (US);
Ronald S. Fearing, El Cerrito, CA (US);
The Regents of the University of California, Oakland, CA (US);
Abstract
A fabricated nano-structure includes a substrate, a supporting stalk, a node, and at least two spatular plate portions. The supporting stalk has a first end opposite a second end. The first end of the supporting stalk is connected to the substrate. The supporting stalk has a diameter range of about 50 nanometers to about 2 microns. A node is disposed at the second end of the supporting stalk. At least two spatular plate portions are connected to the node. The at least two spatular plate portions have planar geometries and are radially distributed about the node. The at least two spatular plate portions has a ratio of a maximum plate thickness to a maximum plate length of at most about 1:20. The maximum plate length is measured along a line from a boundary of the spatular plate portion to a centroid of the node. The maximum plate length is at least about 100 nanometers. The at least two spatular plate portion adhere to a contact surface using intermolecular forces when the spatular plate portions are in contact with the contact surface.