The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2012
Filed:
Oct. 20, 2008
Nobuhiro Oosaki, Sodegaura, JP;
Taiichi Sakaya, Chiba, JP;
Nobuhiro Oosaki, Sodegaura, JP;
Taiichi Sakaya, Chiba, JP;
Sumitomo Chemical Company, Limited, Tokyo, JP;
Abstract
A method for producing a multilayer structure including a first layer and a second layer adjacent to the first layer, wherein the first layer comprises a first inorganic laminar compound and the second layer comprises a second inorganic laminar compound, comprising applying a first coating slip comprising a first liquid medium and a first material onto a substrate and removing the first liquid medium, and a step of applying a second coating slip comprising a second liquid medium and a second material onto the first layer and removing the second liquid medium, wherein the first coating slip and the second coating slip satisfy a requirement that the ratio of the dry volume of the second inorganic laminar compound to the dry volume of the second material is higher than the ratio of the dry volume of the first inorganic laminar compound to the dry volume of the first material.