The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2012
Filed:
Aug. 25, 2010
Kenichi Ishizuka, Ashigara-kami-gun, JP;
Taisei Nishimi, Ashigara-kami-gun, JP;
Kenichi Ishizuka, Ashigara-kami-gun, JP;
Taisei Nishimi, Ashigara-kami-gun, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
A method of manufacturing a polymer film having a microphase-separated morphology includes a film-forming step in which a solution containing a block copolymer having two or more types of polymer chains which are mutually incompatible and are bonded to each other, a first solvent and a second solvent having a higher boiling point by at least 15° C. than the first solvent is applied onto a substrate and the first solvent is removed to form a film; a heating step in which the film is heated at a temperature which is higher than the boiling point of the first solvent but is lower than the boiling point of the second solvent to make the film formed have a microphase-separated morphology; and a solvent removal step in which the second solvent is removed from the film having the microphase-separated morphology to form the polymer film having the microphase-separated morphology.