The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2012
Filed:
Jan. 23, 2009
Goro Fujita, Kanagawa, JP;
Seiji Kobayashi, Kanagawa, JP;
Kimihiro Saito, Saitama, JP;
Shingo Imanishi, Kanagawa, JP;
Goro Fujita, Kanagawa, JP;
Seiji Kobayashi, Kanagawa, JP;
Kimihiro Saito, Saitama, JP;
Shingo Imanishi, Kanagawa, JP;
Sony Corporation, Tokyo, JP;
Abstract
A method for manufacturing a microlens includes forming a microlens by pressing a microlens mold having a reverse shape of a microlens formed therein on a microlens-forming film formed on a substrate to transfer the reverse shape of the microlens to the microlens-forming film. The microlens mold is formed by irradiating an inorganic resist film which is formed on a mold substrate with exposure light by relative two-dimensional scanning, and etching an exposed region of the inorganic resist film to form the reverse shape of the microlens. The irradiation intensity of the exposure light is adjusted to correspond to the depth of the reverse shape of the microlens from the surface of the inorganic resist film on the basis of profile data of the reverse shape of the microlens.