The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2012
Filed:
Jul. 28, 2008
Hiroshi Hiroshima, Tsukuba, JP;
Hiroshi Hiroshima, Tsukuba, JP;
Abstract
In order to prevent occurrence of a residual film distribution dependent upon a pattern density of a mold, in producing the mold to be used for imprint lithography, by etching using a mask, use is made of a first mask Mfor forming a desired pattern to be formed on a surface of the mold, and a second mask Mfor partially covering the first mask such that the area covering openings of the first mask is made larger as an opening ratio of the pattern formed on the first mold surface is higher, thereby to make a volume of a recess of the mold in a given area; in which, after the mold is etched by the first mask, etching is further conducted by covering partially the first mask with the second mask without removing the first mask; or alternatively, the etching is conducted with the first mask and the second mask overlapped from the beginning, thereby to use the second mask as a mask for delaying the etching, for conduct the etching.