The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 13, 2012

Filed:

May. 07, 2009
Applicant:

Morteza M. Farr, Santa Cruz, CA (US);

Inventor:

Morteza M. Farr, Santa Cruz, CA (US);

Assignee:

Innovative Spine LLC., Clovis, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61B 17/70 (2006.01);
U.S. Cl.
CPC ...
Abstract

Improved implant devices and methods for interspinous distraction distribute the load of interspinous distraction so that the entire load is not bearing on the interspinous surfaces. The implant device has a narrow midsection and two wider, flange-shaped outer sections. The wider, flange-shaped outer sections can be tightened to bear against the thicker bony portions of the spinous processes to support some of the load. Optionally, the wider, flange-shaped outer sections can be configured with pins that will penetrate and engage the thicker bony portions of the spinous processes, which will increase the load bearing potential of the wider, flange-shaped outer sections. Additionally, the wider, flange-shaped outer sections and the pins will help to stabilize the joint. The joint stabilization may help to prevent further dislocation of the vertebra that occurs with spondylolisthesis.


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