The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2012
Filed:
Nov. 01, 2004
Masayasu Suzuki, Hadano, JP;
Masayasu Suzuki, Hadano, JP;
Shimadzu Corporation, Kyoto, JP;
Abstract
This surface wave excitation plasma CVD system, along with feeding a material gas including silicon element by feeding the material gas into a chamberfrom at least one of an upper surface gas introduction conduit and a side surface gas introduction conduit, also activates the material gas with a surface wave excitation plasma and feeds a process gas which initiates chemical reactions within the material gas into the chamberfrom a process gas introduction conduit. A gas feed aperture of the upper surface gas introduction conduit and/or the side surface gas introduction conduit is provided in a position which is closer to the substrate than the gas feed aperture of the process gas introduction conduit.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile