The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2012
Filed:
Nov. 22, 2006
Takeshi Hidaka, Tokyo, JP;
Yasushi Nakamura, Uenohara, JP;
Tomonori Imamura, Tokyo, JP;
Shinya Okamoto, Tokyo, JP;
Hirotaka Koyo, Tokyo, JP;
Yasuhiro Saito, Tokyo, JP;
Keiji Tsunetomo, Tokyo, JP;
Takeshi Hidaka, Tokyo, JP;
Yasushi Nakamura, Uenohara, JP;
Tomonori Imamura, Tokyo, JP;
Shinya Okamoto, Tokyo, JP;
Hirotaka Koyo, Tokyo, JP;
Yasuhiro Saito, Tokyo, JP;
Keiji Tsunetomo, Tokyo, JP;
Olympus Corporation, Tokyo, JP;
Abstract
A glass substrate processing method includes irradiating laser light L onto a glass substratesuch that the laser light L is focused within the glass substrate, thereby forming a high density areathat has a higher density than areas where the laser light L is not irradiated around the portion where the laser light L is focused; and performing chemical etching on the glass substrateusing an etching solution such that at least a portion of the high density area is allowed to remain, thereby forming a projectionon a surfaceof the glass substrate