The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 06, 2012
Filed:
Aug. 17, 2005
Applicants:
Katsushi Nakano, Kumagaya, JP;
Tsuneyuki Hagiwara, Tokyo, JP;
Inventors:
Katsushi Nakano, Kumagaya, JP;
Tsuneyuki Hagiwara, Tokyo, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03B 27/58 (2006.01);
U.S. Cl.
CPC ...
Abstract
Provided is an exposure apparatus that is able to prevent liquid from remaining on a measuring part. An exposure apparatus comprises a measuring system (), which has a first pattern () formed on the upper surface of a substrate stage, and a second area (S) specified on the upper surface in the vicinity of a first area (S), which includes the first pattern (), and a second pattern () is formed in the second area (S) so that the liquid (LQ) that has remained so as to span the first area (S) and the second area (S) retreats from the first area (S) and collects in the second area (S).