The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 06, 2012
Filed:
Mar. 03, 2010
Kazuaki Okamori, Kanagawa-ken, JP;
Kazuaki Okamori, Kanagawa-ken, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
A line pattern is formed on a substrate by performing a first step and a second step. In the first step, a liquid material containing a pattern formation material dispersed or dissolved therein is dropped onto the substrate and dried. In the second step, the liquid material is dropped onto a dried body that has been obtained by drying the liquid material in the first step. In the second step, the liquid material is dropped at a smaller ejection amount than that of the first step. Further, the pitch of dropping the liquid material onto the substrate in the first step and the pitch of dropping the liquid material onto the dried body in the second step are less than or equal to a jaggy generation limit.