The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 06, 2012
Filed:
Jun. 10, 2010
Mark E. Salvati, Lawrenceville, NJ (US);
Heather Finlay, Skillman, NJ (US);
Bang-chi Chen, Plainsboro, NJ (US);
Lalgudi S. Harikrishnan, Princeton, NJ (US);
Ji Jiang, West Windsor, NJ (US);
James A. Johnson, Pennington, NJ (US);
Muthoni G. Kamau, Lawrenceville, NJ (US);
R. Michael Lawrence, Yardley, PA (US);
Jianqing LI, Guilford, CT (US);
John Lloyd, Yardley, PA (US);
Michael M. Miller, Pennington, NJ (US);
Zulan Pi, Pennington, NJ (US);
Jennifer X. Qiao, Princeton, NJ (US);
Richard A. Rampulla, Flemington, NJ (US);
Jacques Y. Roberge, Princeton, NJ (US);
Tammy C. Wang, Lawrenceville, NJ (US);
Yufeng Wang, North Brunswick, NJ (US);
Wu Yang, Princeton Junction, NJ (US);
Mark E. Salvati, Lawrenceville, NJ (US);
Heather Finlay, Skillman, NJ (US);
Bang-Chi Chen, Plainsboro, NJ (US);
Lalgudi S. Harikrishnan, Princeton, NJ (US);
Ji Jiang, West Windsor, NJ (US);
James A. Johnson, Pennington, NJ (US);
Muthoni G. Kamau, Lawrenceville, NJ (US);
R. Michael Lawrence, Yardley, PA (US);
Jianqing Li, Guilford, CT (US);
John Lloyd, Yardley, PA (US);
Michael M. Miller, Pennington, NJ (US);
Zulan Pi, Pennington, NJ (US);
Jennifer X. Qiao, Princeton, NJ (US);
Richard A. Rampulla, Flemington, NJ (US);
Jacques Y. Roberge, Princeton, NJ (US);
Tammy C. Wang, Lawrenceville, NJ (US);
Yufeng Wang, North Brunswick, NJ (US);
Wu Yang, Princeton Junction, NJ (US);
Bristol-Myers Squibb Company, Princeton, NJ (US);
Abstract
Compounds of formula Ia and Ib and wherein A, B, C and Rare described herein.