The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 06, 2012

Filed:

May. 22, 2007
Applicants:

Dietmar C. Eberlein, Wappingers Falls, NY (US);

Robert H. Detig, New Providence, NJ (US);

Inventors:

Dietmar C. Eberlein, Wappingers Falls, NY (US);

Robert H. Detig, New Providence, NJ (US);

Assignee:

Electrox Corporation, Denville, NJ (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03G 13/32 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for building microstructures, comprising the steps of forming a photopolymer mask on a substrate, having a mask thickness equal to or larger than a desired height of a microstructure to be formed; forming a latent image on the photopolymer mask by exposure to light; applying an electrical charge to the photopolymer mask; developing the cavities in the mask with a functional liquid toner material whose electrical charge polarity is the same as the charge on the mask; and solidifying the functional liquid toner material into a useful microstructure.


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