The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8304021 B1

PDF
Full Text
Expired
Date of Patent:
Nov. 06, 2012

Filed:

Sep. 17, 2009
Applicants:

Tomoe Yamamoto, Kawasaki, JP;

Tomohisa Iino, Kawasaki, JP;

Inventors:

Tomoe Yamamoto, Kawasaki, JP;

Tomohisa Iino, Kawasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/16 (2006.01); C23C 16/18 (2006.01); C23C 16/52 (2006.01); C23F 1/00 (2006.01); H01L 21/36 (2006.01); C23C 16/44 (2006.01);
U.S. Cl.
CPC ...
Abstract

A vapor phase deposition apparatusfor forming a thin film comprising a chamber, a piping unitfor supplying a source material of the thin film into the chamberin a gaseous condition, a vaporizerfor vaporizing the source material in a source material containerand supplying the vaporized gas in the piping unitand a temperature control unit, is presented. The temperature control unitcomprises: a first temperature control unit, which is composed of a heater controller unitand a tape heaterand is capable of controlling the temperature of the first pipingin the piping unitthat is directly connected to the chamber; a second temperature control unit, which is composed of a heater controller unitand a tape heaterand is capable of controlling the temperature of the second pipingthat is connected to the vaporizer; and a third temperature control unit, which is composed of a heater controller unitand a thermostatic chamberand is capable of controlling the temperature of the valve


Find Patent Forward Citations

Yamamoto, Tomoe. (2012). Vapor phase deposition apparatus, method for depositing thin film and method for manufacturing semiconductor device (U.S. Patent No. 8304021). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8304021

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