The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 06, 2012

Filed:

Nov. 25, 2008
Applicants:

Ronald Chang, Redwood City, CA (US);

Douglas B. Dority, Mill Valley, CA (US);

Lee A. Christel, Palo Alto, CA (US);

Robert Yuan, Belmont, CA (US);

Kurt E. Petersen, Santa Clara, CA (US);

Inventors:

Ronald Chang, Redwood City, CA (US);

Douglas B. Dority, Mill Valley, CA (US);

Lee A. Christel, Palo Alto, CA (US);

Robert Yuan, Belmont, CA (US);

Kurt E. Petersen, Santa Clara, CA (US);

Assignee:

Capheid, Sunnyvale, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 15/06 (2006.01); G01N 21/75 (2006.01); G05D 23/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An apparatus for controlling the temperature of a reaction mixture contained in a chamber of a reaction vessel comprises a thermal surface for contacting a flexible wall of the chamber and an automated machine for increasing the pressure in the chamber. The pressure increase in the chamber is sufficient to force the flexible wall to conform to the thermal surface for good thermal conductance. The apparatus also includes at least one thermal element for heating or cooling the surface to induce a temperature change within the chamber.


Find Patent Forward Citations

Loading…