The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 06, 2012
Filed:
Sep. 30, 2008
Kento Edakara, Tokyo, JP;
Hiromichi Umehara, Tokyo, JP;
Noriaki Kasahara, Tokyo, JP;
Michitaka Nishiyama, Tokyo, JP;
Kento Edakara, Tokyo, JP;
Hiromichi Umehara, Tokyo, JP;
Noriaki Kasahara, Tokyo, JP;
Michitaka Nishiyama, Tokyo, JP;
TDK Corporation, Tokyo, JP;
Abstract
The present invention relates to a method for forming a dry etching mask. A plurality of aluminum oxide films are sequentially sputtered on a material to be dry etched in such a manner that etching rate with respect to reactive ion etching increases toward a lower layer. On a laminated film of the plurality of aluminum oxide films, there is formed a first mask that has etching resistance with respect to the reactive ion etching. Reactive ion etching is performed from above the first mask to form a second mask of the laminated film.