The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 06, 2012
Filed:
Mar. 28, 2008
Shogo Okita, Hyogo, JP;
Syouzou Watanabe, Osaka, JP;
Hiroyuki Suzuki, Osaka, JP;
Ryuuzou Houtin, Osaka, JP;
Shogo Okita, Hyogo, JP;
Syouzou Watanabe, Osaka, JP;
Hiroyuki Suzuki, Osaka, JP;
Ryuuzou Houtin, Osaka, JP;
Panasonic Corporation, Osaka, JP;
Abstract
A plasma etching apparatus includes a pressure-reducible chamber, a placement sectionfor supporting an object to be treated within the chamber, a dielectric memberfor sealing an upper opening of the chamber, and a coilprovided outside the dielectric member. The coilgenerates a plasmain the chamberby inductive coupling so that the objectis subjected to etching. The dielectric memberhas recess portionsdiscontinuous to one another. Portions of the dielectric memberform large-thickness portions. A thickness of the dielectric memberin the recess portionsis smaller than a thickness of the large-thickness portions. The recess portionsare placed according to distribution densities of conductors constituting the coil