The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 06, 2012

Filed:

Nov. 21, 2008
Applicants:

Hubert Moriceau, Saint Egreve, FR;

Maurice Couchaud, Izeron, FR;

Jean-luc Deschanvres, Meylan, FR;

Anne-laure Joudrier, Vert-Saint-Denis, FR;

Inventors:

Hubert Moriceau, Saint Egreve, FR;

Maurice Couchaud, Izeron, FR;

Jean-Luc Deschanvres, Meylan, FR;

Anne-Laure Joudrier, Vert-Saint-Denis, FR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B 38/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

A process of transferring a layer of a first material from a first substrate, having defects in a zone close to the surface, onto a host substrate made of a second material includes a step of thinning the first substrate in order to form a first thinned substrate, an ion or atom implantation in the first substrate in order to form an implantation plane therein, delimiting the layer to be transferred, and a transfer of the layer onto the host substrate by fracturing the substrate along the implantation plane.


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