The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 06, 2012
Filed:
Jan. 15, 2008
Hiroshi Tamagaki, Takasago, JP;
Hiroshi Tamagaki, Takasago, JP;
Kobe Steel, Ltd., Kobe-shi, JP;
Abstract
The plasma CVD apparatus of the present invention comprises a pair of deposition rollsanddisposed oppositely in parallel so that a substrate S wound thereon faces each other; a magnetic field generating memberandprovided inside each of the deposition rollsand, which generates a magnetic field so as to converge plasma to the vicinity of a roll surface thereof facing a spacebetween the deposition rolls; a plasma power sourcewith polarity alternately reversing between one electrode and the other electrode; a gas supply pipefor supplying a film-forming gas to the space; and evacuation means for evacuating the space. One electrode of the plasma power sourceis connected to one deposition roll, and the other electrode thereof to the other deposition roll