The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2012
Filed:
Jun. 30, 2009
Method for dynamic aperture determination for three-dimensional surface-related multiple elimination
Robertus F. Hegge, Rijswijk, NL;
Roald G. Van Borselen, Voorschoten, NL;
Robertus F. Hegge, Rijswijk, NL;
Roald G. van Borselen, Voorschoten, NL;
PGS Geophysical AS, Lysaker, NO;
Abstract
Dips are calculated for a series of sets of adjacent multiple contribution traces, from seismic data representative of subsurface formations, in the vicinity of a boundary of an aperture of a multiple contribution gather, the seismic data acquired by deploying a plurality of seismic sensors proximate an area of the earth's subsurface to be evaluated, the seismic sensors generating at least one of an electrical and optical signal in response to seismic energy. The boundary of the aperture of the multiple contribution gather is recursively extended, based on the calculated dips. Multiple contribution traces in the multiple contribution gather with the extended aperture boundary are stacked to generate predicted multiple traces. The predicted multiple traces are subtracted from the seismic data to generate surface-related multiple attenuated data useful for imaging the subsurface formations.