The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2012
Filed:
Jun. 23, 2010
Martin Vossiek, Hildesheim, DE;
Stephan Max, Neubokel/Grifhorn, DE;
Martin Vossiek, Hildesheim, DE;
Stephan Max, Neubokel/Grifhorn, DE;
Symeo GmbH, Neubiberg, DE;
Abstract
The invention relates to an imaging method with synthetic aperture for determining an incident angle and/or a distance of a sensor from at least one object in space, wherein at each of a number of aperture points one echo profile is sensed. Advantageously, for several angles assumed as the incident angle, one phase correction value and/or one distance correction value is calculated, adapted profiles are generated based on the echo profiles by adapting the phase with the phase correction value for each assumed angle and/or by shifting the distance with the distance correction value, for the assumed angle, the adapted profiles are summed or integrated, and a probability distribution is derived, and a probability value for the incident angle and/or for the distance is determined therefrom. A determination of the incident angle is also possible independently of the distance, wherein it is possible to only consider velocities or accelerations.