The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 30, 2012

Filed:

Sep. 11, 2007
Applicants:

Simon Martin Hooker, Oxford, GB;

Anthony Joseph Gonsalves, Oxford, GB;

Dino Anthony Jaroszynski, Glasgow, GB;

Wim Pieter Leemans, Berkeley, CA (US);

Inventors:

Simon Martin Hooker, Oxford, GB;

Anthony Joseph Gonsalves, Oxford, GB;

Dino Anthony Jaroszynski, Glasgow, GB;

Wim Pieter Leemans, Berkeley, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05B 31/26 (2006.01); H05H 1/54 (2006.01); G21K 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of accelerating charged particles using a laser pulse fired through a plasma channel contained in a capillary, wherein the plasma waveguide has deviations along its length that cause deviations in the plasma density contained therein, the deviations in plasma density acting to promote charged particle injection into a wake of a passing laser pulse. A radiation source based on a laser-driven plasma accelerator in a plasma waveguide in which the plasma waveguide and/or laser injection process is/are controlled so as to produce an undulating path for the laser pulse through the waveguide, the undulation exerting a periodic transverse force on charged particles being accelerated in the wake of the laser pulse, the resulting charged particle motion causing controlled emission of high frequency radiation pulses.


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