The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8299543 B1

PDF
Full Text
Expired
Date of Patent:
Oct. 30, 2012

Filed:

Mar. 09, 2012
Applicants:

Takashi Sakoh, Kanagawa, JP;

Hiroki Shirai, Kanagawa, JP;

Inventors:

Takashi Sakoh, Kanagawa, JP;

Hiroki Shirai, Kanagawa, JP;

Assignee:

Renesas Electronics Corporation, Kawasaki-shi, Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/76 (2006.01); H01L 31/062 (2012.01);
U.S. Cl.
CPC ...
Abstract

A semiconductor device, includes a substrate, an element isolating film formed in the substrate, a first element formation region isolated by the element isolating film, a second element formation region positioned adjacent to the first element formation region and isolated by the element isolating film, a first well of a second conductive type formed in a whole area of the first element formation region, a first transistor of a first conductive type formed on the first element formation region, a second transistor of the first conductive type which is formed on the first element formation region and whose threshold voltage is the same as a threshold voltage of the first transistor, a second well of the second conductive type formed in a whole area of the second element formation region, and a third transistor of the first conductive type formed on the second element formation region.


Find Patent Forward Citations

Sakoh, Takashi. (2012). Method of manufacturing semiconductor device having plural transistors formed in well region and semiconductor device (U.S. Patent No. 8299543). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8299543

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