The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2012
Filed:
Jul. 16, 2009
Yunyou Zheng, Beijing, CN;
Jae Yun Jung, Beijing, CN;
Zhi Hou, Beijing, CN;
Zuhong Liu, Beijing, CN;
Jeong Hun Rhee, Beijing, CN;
Yunyou Zheng, Beijing, CN;
Jae Yun Jung, Beijing, CN;
Zhi Hou, Beijing, CN;
Zuhong Liu, Beijing, CN;
Jeong Hun Rhee, Beijing, CN;
Beijing Boe Optoelectronics Technology Co., Ltd., Beijing, CN;
Abstract
A method of forming a photoresist burr edge and a method of manufacturing an array substrate are provided in the present invention. The method of manufacturing an array substrate comprises: forming a gate line and a gate electrode on a substrate; forming a data line, a source electrode, a drain electrode and a TFT channel region without removing the photoresist on the data line, the source electrode and the drain electrode; depositing a passivation layer; removing the remained photoresist and the passivation layer thereon by a lifting-off process; applying a photoresist layer; forming a photoresist burr edge of peak shape; depositing a transparent conductive film; forming a pixel electrode by a lifting-off process, wherein the pixel electrode is directly connected with the drain electrode.