The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8298362 B1

Date of Patent:

Oct. 30, 2012

Filed:

Feb. 25, 2010

Manufacturing method for plasma display panel

Applicants:

Masahiro Sakai, Kyoto, JP;

Keisuke Okada, Osaka, JP;

Yayoi Okui, Osaka, JP;

Inventors:

Masahiro Sakai, Kyoto, JP;

Keisuke Okada, Osaka, JP;

Yayoi Okui, Osaka, JP;

Assignee:

Panasonic Corporation, Osaka, JP;

Attorney:

Primary Examiner:

Christopher Schatz

Assistant Examiner:

Matthew Hoover

Int. Cl.

CPC ...

B29C 65/00 (2006.01); B29C 45/00 (2006.01); B29C 47/00 (2006.01); B29C 39/02 (2006.01); B29C 43/02 (2006.01); B29C 49/08 (2006.01); B29C 67/00 (2006.01); B29C 49/00 (2006.01); B29C 51/00 (2006.01); B29C 39/14 (2006.01); B29C 55/00 (2006.01); B29C 67/20 (2006.01); B29C 43/10 (2006.01); B32B 17/00 (2006.01); B32B 37/00 (2006.01); C03C 27/00 (2006.01); B29D 22/00 (2006.01); B29D 24/00 (2006.01); B29D 29/00 (2006.01); B29D 7/00 (2006.01); B29B 15/00 (2006.01); B28B 21/36 (2006.01); B28B 11/08 (2006.01); A23P 1/00 (2006.01); B29B 11/06 (2006.01); B29C 35/00 (2006.01); B29C 55/28 (2006.01); A01J 21/00 (2006.01); A01J 25/12 (2006.01); A21C 3/00 (2006.01); A21C 11/00 (2006.01); A23G 1/20 (2006.01); A23G 3/02 (2006.01);

U.S. Cl.

CPC ...

Abstract

The present invention aims to provide a manufacturing method for a PDP which allows even high-definition and ultra-high-definition PDPs to demonstrate an excellent image display capability at improved luminous efficiency, by suppressing variation of a discharge gas composition, and by eliminating an impurity gas in a discharge space effectively. To achieve the aim, deterioration of an absorbent materialcomposed of copper ion-exchanged ZSM-5-type zeolite is prevented, by performing both sealing and evacuation steps for the front substrateand back substratein a non-oxidizing gas atmosphere. This maintains properties of the absorbent materialfor absorbing the impurity gas without degradation, even if the absorbent materialabsorbs a Xe gas in a discharge gas introducing step.

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