The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2012
Filed:
Dec. 19, 2008
Applicant:
Lap-tak Andrew Cheng, Newark, DE (US);
Inventor:
Lap-Tak Andrew Cheng, Newark, DE (US);
Assignee:
E I du Pont de Nemours and Company, Wilmington, DE (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 9/12 (2006.01);
U.S. Cl.
CPC ...
Abstract
This invention relates to a method for the fabrication of electrical and electronic devices using a photoresist deposited in pre-existing through holes in a device structure and a thick film paste, and to the devices made by such method. The method allows thick film paste deposits in the corners of the holes. This invention also relates to devices made with thick film pastes that are patterned using a diffusion layer made from residual photoresist deposits in a hole.